Method of using electrical test structure for semiconductor trench depth monitor

ABSTRACT

Embodiments provide a method and device for electrically monitoring trench depths in semiconductor devices. To electrically measure a trench depth, a pinch resistor can be formed in a deep well region on a semiconductor substrate. A trench can then be formed in the pinch resistor. The trench depth can be determined by an electrical test of the pinch resistor. The disclosed method and device can provide statistical data analysis across a wafer and can be implemented in production scribe lanes as a process monitor. The disclosed method can also be useful for determining device performance of LDMOS transistors. The on-state resistance (Rdson) of the LDMOS transistors can be correlated to the electrical measurement of the trench depth.

DESCRIPTION OF THE INVENTION

1. Field of the Invention

This invention relates generally to semiconductor trench depth monitors using an electrical trench test structure and method for their use.

2. Background of the Invention

In the fabrication of semiconductor devices, isolation structures are formed between active areas in which electrical devices such as transistors, memory cells, or the like, are to be formed. The isolation structures are typically formed during initial processing of a semiconductor substrate, prior to the formation of electrical active devices. Typical isolation techniques include shallow trench isolation (STI), which may enable an active area with high density. In addition, the flatness of the resulting wafer enables more precise pattern definition for subsequent layers.

Shallow trench isolation (STI) techniques involve the formation of shallow trenches, which may then be filled with dielectric material, such as silicon dioxide, to provide electrical isolation. During the formation of shallow trenches, trench depth control across a wafer is critical in trench etching, because the trench depth uniformity determines the uniformity of the fill and the following planarization processes such as CMP (i.e., chemical-mechanical polishing). More importantly, as feature sizes decrease, precise control of the trench depth becomes even more critical for device performance.

One conventional technique for characterizing the trench depth is SEM (i.e., scanning electron microscope) cross-section analysis. However, this conventional technique has drawbacks and disadvantages. For example, in order to do the cross-section analysis, the wafer sample has to be destroyed to expose the cross-section of the sample. In addition, the SEM analysis is time-consuming with turnaround times measured in days, which significantly delays diagnosing process issues. Further, SEM resolution presents a problem for repeatable depth measurement of sub-micron features.

A second conventional technique for characterizing the trench depth is stylus profilometry, which is a non-destructive method. In this method, step-height measurements are conducted on test structures to monitor trench depth before filling the trench. However, this method also has drawbacks and disadvantages. For example, one drawback is caused by the lack of high aspect ratio capability and high stylus forces that prevent within-die measurements.

A third conventional technique for characterizing the trench depth is in-line profilometry, such as an AFP (i.e., Atomic Force Profilometry) technique, which is a non-destructive in-line monitor for smaller STI structures. The in-line profilometry technique may be used in a production environment. However, it also has drawbacks and disadvantages. For example, one drawback is that only limited data can be collected. To understand the process uniformity, it is often desired to collect statistical data for a wafer and/or further make parametric correlation with device performance while monitoring the trench depth. However, in-line data is in general very limited and insufficient for this.

Thus, there is a need to overcome these and other problems of the prior art and to provide a non-destructive method for semiconductor trench depth monitor using an electrical trench test structure.

SUMMARY OF THE INVENTION

According to various embodiments, the present teachings include a method for monitoring trench depth in a semiconductor device. In this method, a pinch resistor can be formed in a semiconductor region. The conductivity type for the pinch resistor and the semiconductor region is opposite. In the pinch resistor, a trench can then be formed and filled with a dielectric material. The trench depth can be determined by measuring a pinch resistance of the pinch resistor.

According to various embodiments, the present teachings also include a method for monitoring semiconductor device performance. In this method, a semiconductor MOS transistor is formed and isolated by a trench test structure. The trench test structure includes a semiconductor region isolated by a pinch resistor and a trench formed in the pinch resistor and filled with a dielectric material. The trench depth is determined by monitoring the pinch resistance. The on-state resistance (Rdson) of the MOS transistor is determined based on the measured trench depth.

Additional objects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objects and advantages of the invention will be realized and attained by means of the elements and combinations particularly pointed out in the appended claims.

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention, as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate several embodiments of the invention and together with the description, serve to explain the principles of the invention.

FIG. 1 depicts an exemplary method for electrically monitoring semiconductor trench depth using a trench test structure in accordance with the present teachings.

FIGS. 2A-2E depict cross-sectional views for an exemplary trench test structure at various stages of fabrication in accordance with the present teachings.

FIG. 3 depicts exemplary experimental data for the trench depth and the corresponding pinch resistance plotted in a form of an x-y graph in accordance with the present teachings.

FIG. 4 depicts an exemplary wafer map for pinch resistance of the trench test structure in accordance with the present teachings.

FIG. 5 depicts an exemplary method for monitoring device performance using the trench test structure in accordance with the present teachings.

FIG. 6 depicts an exemplary set of data points for the trench depth and the corresponding on-state resistance (Rdson) for an exemplary LDMOS transistor in accordance with the present teachings.

DESCRIPTION OF THE EMBODIMENTS

Reference will now be made in detail to exemplary embodiments of the invention, an example of which is illustrated in the accompanying drawings. Wherever possible, the same reference numbers will be used throughout the drawings to refer to the same or like parts.

In the following description, reference is made to the accompanying drawings that form a part thereof and in which is shown by way of illustration specific exemplary embodiments in which the invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention and it is to be understood that other embodiments may be utilized and that changes may be made without departing from the scope of the invention. The following description is, therefore, merely exemplary.

Notwithstanding that the numerical ranges and parameters setting forth the broad scope of the invention are approximations, the numerical values set forth in the specific examples are reported as precisely as possible. Any numerical value, however, inherently contains certain errors necessarily resulting from the standard deviation found in their respective testing measurements. Moreover, all ranges disclosed herein are to be understood to encompass any and all sub-ranges subsumed therein. For example, a range of “less than 10” can include any and all sub-ranges between (and including) the minimum value of zero and the maximum value of 10, that is, any and all sub-ranges having a minimum value of equal to or greater than zero and a maximum value of equal to or less than 10, e.g., 1 to 5.

As used herein, a trench test structure may be formed including a pinch resistor. The trench test structure may be fabricated using semiconductor materials such as in a wafer with two different types of conductivity, for example, a p-type conductivity material may be disposed in an n-type region. In addition, a trench region may be formed on the p-type material region, wherein the p-type region may be the pinch resistor. Accordingly, the pinch resistor (i.e., the p-type region) may isolate the n-type region of the trench test structure from other wafer components.

In various embodiments, the trench test structure disclosed herein may be incorporated into a variety of active devices, such as, for example, transistors, memory cells or the like, to electrically monitor the trench depth and/or to monitor parameters that may be of interests for active devices. For example, active devices such as MOS transistors such as CMOS, LDMOS, etc., a break down voltage and an on-state resistance (Rdson) may be important parameters, which may be determined by monitoring corresponding trench depth using the trench test structure.

FIG. 1 depicts an exemplary method for electrically monitoring semiconductor trench depth using the trench test structure in accordance with the present teachings. As shown, at 110, the trench test structure may be fabricated with a pinch resistor in such as a wafer.

In various embodiments, the trench test structure may be fabricated using linear BiCMOS manufacturing techniques, such as those developed by Texas Instruments Incorporated, for example, as described in U.S. Pat. No. 6,130,122, which is incorporated by reference herein in its entirety. The fabrication process may employ various known semiconductor fabrication techniques, such as, for example, photolithographic techniques, CVD (chemical vapor deposition) techniques, or etching techniques such as plasma dry etching. Various materials are deposited, grown, or implanted to form the trench test structure.

FIGS. 2A-2E show cross-sectional views for an exemplary trench test structure at various stages of fabrication in accordance with various embodiments. It should be readily obvious to one of ordinary skill in the art that the trench test structure depicted in FIGS. 2A-2E represents a generalized schematic illustration and that other regions/wells/layers may be added or existing regions/wells/layers may be removed or modified.

In FIG. 2A, the trench test structure fabricated over a substrate 210 may include a deep well 220, and a well 230 that may be fabricated inside the deep well 220 as a pinch resistor. The deep well 220 may be a high voltage, low concentration, deep diffusion region that may serve to isolate the well 230 (i.e., the pinch resistor) from other wafer components.

In various embodiments, the trench test structure may be fabricated as STI structures for various active devices such as LDMOS transistors. Accordingly, the substrate 210 may be a typical silicon substrate that is well-known to those skilled in the art. More specifically, the deep well 220 of the trench test structure may be diffused on the silicon substrate 210. The deep well 220 may be a deep well of a first conductivity type of the trench test structure. The conductivity type for the deep well 220 and the silicon substrate 210 may be opposite. For example, typically, in an LDMOS, the deep well 220 may be an n type (e.g., phosphorous), while the silicon substrate 210 may be a p type.

The well 230 may be a double-diffused well (Dwell) with a p-type and n-type dopants co-implanted and diffused at the same time having both n-type and p-type layers. During diffusion, the p-type and n-type regions of the well 230 diffuse laterally as well as vertically. When the p-type diffuses more than the n-type, a p-type Dwell may result for the well 230. In various embodiments, the well 230 may be any single-diffused well. The well 230 may have a second conductivity type that may be opposite to the conductivity type for the deep well 220. For example, in LDMOS, the well 230 may be a special p-type well used to build high voltage. In various embodiments, the well 230 may be a diffused or implanted p-type base region of a bipolar transistor.

In various embodiments, the use of p and n type semiconductor regions may be reversed for the trench test structure and the accommodated active devices. For example, the trench test structure may be formed by an n type semiconductor region (such as for the deep well 220) having a first conductivity and a p type semiconductor region (such as for the well 230) having a second conductivity, or vice versa.

In FIG. 2B, trench regions 240 may be formed in the trench test structure by first forming trenches by etching cavities into the wafer shown in FIG. 2A using a nitride as an etch mask. Any suitable etch processes and/or chemistries well known to one of the ordinary skill in the art may be employed. The formed trenches may then be filled with dielectric material such as, for example, by depositing oxide or other dielectric into the trenches and over the remainder of the wafer and thus forming the trench regions 240. Moreover, the trench depth of the trench regions 240 may be indicated by T 245 as illustrated in FIG. 2B.

In FIG. 2C, a surface 250 may be formed by planarizing the entire surface of FIG. 2B using for example CMP (chemical mechanical polishing) or other suitable process to remove the dielectric from the active regions of the wafer while leaving the trenches filled with dielectric. In addition, the surface 250 may then be patterned using, for example, a photolithographic technique to heavily dope the patterned regions in the well 230 as moats 260 a-b. The moats 260 a-b may be implanted with the same type of conductivity as the well 230 (e.g., the second conductivity of the trench test structure), for example, a p-type (e.g. Boron) by an implantation process or a diffusion process.

In various embodiments, depending on electrical active devices the trench test structure is accommodated with, various active structures for electrical devices, such as source, drain or gate regions (not shown) for MOS transistors, may be subsequently formed over the planarized surface 250.

In FIG. 2D, a dielectric isolation layer 270 such as a silicon oxide layer may be formed over the previous surface using, for example, CVD techniques. Conductive contacts 280 a-b may then be formed through the dielectric layer 270 by first forming holes in the layer 270 using patterning and etching process known to one of the ordinary skill in the art. The holes in the layer 270 may then be filled with conductive material such as metal tungsten to form contacts 280 a-b using, for example, CVD techniques. In various embodiments, a planarization process such as CMP may then be conducted to polish the surface.

In FIG. 2E, metal contacts 290 a-b may be formed on the conductive contacts 280 a-b by first depositing a metal such as alumina over the surface and then patterning and etching away metal from undesired regions while leaving metal contacts 290 a-b.

Turning to FIG. 1, at 120, the formed trench test structure may be electrically monitored by measuring the pinch resistance R of the pinch resistor (i.e., well 230 in FIGS. 2A-AE). Specifically, the pinch resistance R may be measured by applying a voltage across the pinch resistor (the well 230) via the metal contacts 290 a-b in FIG. 2E. The current in the pinch resistor may be “pinched” by the trench depth T (see T 145 in FIGS. 2B-2E).

At 130 in FIG. 1, the trench depth T may be correlated with the measured pinch resistance R. More specifically, the trench depth T may have a direct relationship with the pinch resistance R of the trench test structure. Thus, the trench depth T may be monitored by measuring the pinch resistance R. For example, the pinch resistance R and the trench depth T may be related by an equation generally of the form shown in equation (1):

y=ax+b  (1)

where y is the pinch resistance R, x is the trench depth T, and a and b are constants. The form of equation (1) may be determined by measuring the pinch resistance R at various trench depths T.

FIG. 3 shows exemplary experimental data for the trench depth T and the corresponding pinch resistance R plotted in the form of an x-y graph. As shown, the line shape approximation of exemplary data points may be expressed in equation (1) with constant a equal to 14.519, constant b equal to −1628.5 and a R-squared value of 0.9908 indicating a desired data confidence. Generally, a set of constants may cover a wide range of trench test structures.

In various embodiments, the set of constants, that is, a and b in equation (1), may vary with dimensions of the pinch resistor such as length L and width W of the well 230 in FIGS. 2C-2E. The length L and the width W of the well 230 may be determined by the pattern and geometry of the moats 260 a-b in FIGS. 2C-2E, and may be well known to one of the ordinary skill in the art. Accordingly, a very small area (determined by L and W) of the pinch resistor (i.e., the well 230) may be designed for the trench test structures for manufacturing efficiency and device quality. For example, a low or minimum width of the pinch resistor may be designed in a range from about 0.8 μm to about 20 μm for an efficient layout. More importantly, through these types of efficient designs, when measuring the pinch resistance R, very high resistances may be formed in such a very small area to effectively demonstrate the trench depth, and thus achieve high or maximum sensitivity for monitoring the trench depth.

It should be noted that although only a single trench test structure is shown in FIGS. 1-3, the actual wafer may include numerous trench test structures fabricated with active devices according to a layout that may be optimized for manufacturing efficiency and device quality.

FIG. 4 depicts an exemplary wafer map for pinch resistances with a number of trench test structures distributed across the wafer 400. The number on each trench test structure may indicate a pinch resistance R for a corresponding trench test structure. For example, as shown in FIG. 4, some of exemplary trench test structures on the left of wafer 400, such as, 410, 412, 414, and 416, may have pinch resistances of about 53,990 ohm (i.e., for 414) to 55,538 ohm (i.e., for 410). In another example, some of exemplary trench test structures on the right of wafer 400, such as, 470, 472, 474, and 476, may have pinch resistances of about 52,762 ohm (i.e., for 474) to 53,642 ohm (i.e., for 476), indicating lower pinch resistances on the right of the wafer 400. In various embodiments, various active devices may be fabricated incorporating the trench test structures, for example, one or more MOS transistors such as NMOS, PMOS, CMOS, or LDMOS may be fabricated from the wafer 400.

By measuring pinch resistances for the wafer 400, statistical pinch resistance data across the wafer may be obtained. Correlated with equation (1), statistical trench depth data may then be obtained for the wafer 400. Accordingly, the process uniformity of the wafer may be monitored. For example, in FIG. 4, the exemplary trench test structures with lower pinch resistances on the right of the wafer 400, such as, for example, 470, 472, 474, 476, may indicate more shallow trench depths on the right of the exemplary wafer 400. In various embodiments, the electrical monitoring of trench depth may be implemented for as a production monitor in production scribe lanes.

At 140 in FIG. 1, individual or statistical data (i.e., wafer map) for the trench depth T, and/or the pinch resistance R for trench test structures such as STI or any other type of trench structures may be obtained and output. Furthermore, the process uniformity across the wafer may be output.

In various embodiments, electrical monitor of trench depth may be very critical for active devices such as devices for analog high voltage, for example, MOS transistors. Generally, the trench depth has significant impact on the device performance such as the breakdown voltage, the on-state resistance (Rdson), etc. Accordingly, electrical monitoring of trench depth may be used to monitor performance parameters for active devices.

FIG. 5 depicts an exemplary method for determining device performance using a trench test structure. At 510, an exemplary active device, such as an LDMOS, may be fabricated and isolated by a trench test structure. An exemplary LDMOS transistor with shallow trench isolation (STI) formation is described in U.S. Pat. No. 6,900,101. This patent is assigned to Texas Instruments Incorporated and is incorporated by reference herein in its entirety. For example, the fabricated LDMOS may be a “high side” 60 V (volt) device, where the 60 V specification refers to its rated breakdown voltage.

At 520, the pinch resistance R may be monitored by the trench test structure to determine its trench depth T. In various embodiments, a wafer map (for example, as shown in FIG. 4) for the pinch resistor R may be monitored and recorded. The trench depth may then be determined by the corresponding pinch resistance R according to equation (1) or FIG. 3. Accordingly, a statistical data for trench depth may be obtained across wafer.

At 530, the trench depth T may further have a direct relationship with the on-state resistance (Rdson) for such as LDMOS transistors. For example, the Rdson and the trench depth may be related by an equation generally of the form shown in equation (2):

y=m×+n  (2)

where y is the Rdson, x is the trench depth T, and m and n are constants. The form of equation (2) may be determined by testing Rdson at various trench depths T, which may be determined by the electrical monitoring of pinch resistance R in equation (1). The trench depth T and the on-state resistance (Rdson) may be plotted in the form of an x-y graph. FIG. 6 shows an exemplary set of data points for trench depth and the corresponding Rdson for an LDMOS along with their line shape approximation.

As shown in FIG. 6, the line shape approximation of exemplary data points expressed in the equation (2) indicates a set of constants for m and n (i.e., 0.0219 and 158.24 respectively), and a R-squared value of 0.9935 indicting a desired data confidence. Generally, a set of constants may cover a wide range of active devices, that is, LDMOS transistors in this example.

Correlating equations (1) and (2), the pinch resistance R measured at 520 may be directly correlated with parameters of interest for device performance such as the on-state resistance (Rdson) of the exemplary LDMOS device. More specifically, the Rdson in equation (2) may be correlated with the pinch resistance R in equation (1) by the common parameter, the trench depth T. For example, equation (1) may be in a form of

R=aT+b  (3)

where R is the pinch resistance, T is the trench depth, a and b are constants. Equation (2) may be in the form of

Rdson=mT+n  (4)

Where Rdson is the on-state resistance, T is the trench depth and m and n are constants. Comparing equations (3) and (4), the on-state resistance (Rdson) may be correlated with the pinch resistance R as:

$\begin{matrix} {{{Rdson} = {{\left( \frac{m}{a} \right)R} + \left( {n - \frac{mb}{a}} \right)}}{{{where}\left( \frac{m}{a} \right)}\mspace{14mu} {and}\mspace{14mu} \left( {n - \frac{mb}{a}} \right)}} & (5) \end{matrix}$

are constants for a certain active device. Accordingly, the on-state resistance (Rdson) for the active device LDMOS may be monitored by electrically measuring the pinch resistance R of the trench test structure. Moreover, because of the pinch resistance R may be obtained statistically, a wafer map for the on-state resistance (Rdson) may also be obtained. Further, the electrical monitoring of Rdson may be implemented as a process monitor in production scribe lanes.

At 540, the active device performance such as the on-state resistance (Rdson) and the trench depth may be output individually or statistically across the wafer. In addition, the process uniformity of the wafer may be analyzed.

Other embodiments of the invention will be apparent to those skilled in the art from consideration of the specification and practice of the invention disclosed herein. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the invention being indicated by the following claims. 

1. A method for monitoring trench depth in a semiconductor device comprising: forming a semiconductor region having a first conductivity type; forming a pinch resistor in the semiconductor region having a second conductivity type, wherein the second conductivity type is opposite to the first conductivity type; forming a trench in the pinch resistor, wherein the trench is filled with a dielectric material; measuring a pinch resistance of the pinch resistor; and determining a trench depth from the pinch resistance.
 2. The method of claim 1, wherein the first semiconductor region comprises a deep well.
 3. The method of claim 1, wherein the pinch resistor comprises a double-diffused well and a single-diffused well.
 4. The method of claim 1, wherein the first conductivity type comprises an n type, the second conductivity type comprises a p type.
 5. The method of claim 1, wherein determining the trench depth from the pinch resistance comprises correlating the trench depth with the pinch resistance, wherein correlating the trench depth with the pinch resistance comprises a linear correlation.
 6. The method of claim 1, wherein the pinch resistor further comprises a width from about 0.8 μm to about 20 μm.
 7. The method of claim 1 further comprising determining trench depth uniformity across a wafer, wherein the wafer comprises at least one trench region.
 8. The method of claim 1 further comprising determining trench depth during fabrication of the semiconductor device.
 9. The method of claim 1 further comprising monitoring device performance across a wafer, wherein the wafer comprises at least one active device isolated by the trench.
 10. The method of claim 9, wherein the device performance for the at least one active device comprises an on-state resistance (Rdson) for MOS transistors.
 11. A method for monitoring semiconductor device performance comprising: fabricating a semiconductor MOS transistor isolated by a trench test structure; measuring a pinch resistance of the pinch resistor; determining the trench depth based on the pinch resistance; and, determining an on-state resistance (Rdson) of the MOS transistor based on the trench depth.
 12. The method of claim 11, wherein the trench test structure comprises: a semiconductor deep well having a first conductivity type; a pinch resistor formed in the semiconductor deep well having a second conductivity type opposite the first conductivity type; and a trench formed in the pinch resistor with a trench depth, wherein the trench is filled with a dielectric material;
 13. The method of claim 12, wherein the pinch resistor comprises a double-diffused well and a single diffused well.
 14. The method of claim 12, wherein the first conductivity type comprises an n type, the second conductivity type comprises a p type.
 15. The method of claim 11, wherein the trench test structure comprises a shallow trench isolation (STI) structure.
 16. The method of claim 11, wherein determining the trench depth based on the pinch resistance comprises correlating the trench depth with the pinch resistance, wherein the trench depth and the pinch resistance have a linear relationship.
 17. The method of claim 11, wherein determining the on-state resistance (Rdson) of the MOS transistor based on the trench depth comprises correlating the on-state resistance (Rdson) with the trench depth, wherein correlating the on-state resistance (Rdson) with the trench depth comprises a linear correlating.
 18. The method of claim 11, wherein the pinch resistor comprises a width from about 0.8 μm to about 20 μm.
 19. The method of claim 111 further comprising determining the on-state resistance across a wafer, wherein the wafer comprises at least one MOS transistor.
 20. The method of claim 11, further comprising determining the on-state resistance during production of the MOS transistor. 